New semiconductor industry composite material "Gallium Arsenide Nanowire" won the technical patent

Recently, researchers at the Norwegian University of Science and Technology have successfully developed a new semiconductor industrial composite material "Gallium Arsenide Nanowire" and applied for a technical patent. The composite material is based on graphene and has excellent photoelectric properties. Will be highly competitive, this new material is considered to be expected to change the basis of new equipment systems for the semiconductor industry. The technical achievement was published in the American Science Journal Nano Express.

The research team of the Department of Electronics and Telecommunications of the Norwegian University of Science and Technology headed by Professor Helge Weman and CrayoNanoAS jointly developed and jointly applied for a patent. The product uses automatic molecular beam epitaxy to generate semiconductor nanowires on thin atomic graphene. The new electrode has transparency, good toughness and low price. Professor Weman believes that this nanowire is not a brand-new product, but it is a new template for the production method of semiconductor devices. This technology patent can be applied to the future production of solar cells and light-emitting diodes.

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